originally posted by: PapagiorgioCZ
a reply to: StargateSG7
Do they have it patented worldwide forever so I will never be able to buy crystal processor into my Ha'tak?
What about other crystals like Quartz, Zircon and printing some kind of solid 3D architecture between layers?
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Interestingly, the patent I am thinking is is PRECEDED BY this 1994 patent:
Physical vapor deposition of diamond-like carbon films
US 5605759 A
by Robert Prince, Elisa Bourdon
Abstract
A process for forming diamond like films of carbon on substrates at room temperature using physical vapour deposition. A source of carbon is
physically ablated in the vicintity of a substrate to deposit on the substrate all forms of carbon. A physical discrimination process is applied
continuously to remove graphite grains while leaving the aliphatic diamond form intact. The source of carbon is typically a high purity carbon rod.
The substrate is typically metal or glass placed within about 60 centimeters where laser pulse energy of 50 millijoules peak power is used. Physical
ablation is carried out by ion beam, arc or laser ablation. The resulting carbon plume impinges on the substrate and is thermally quenched. Physical
discrimination between carbon forms is by using a laser having a wavelength which is absorbed by graphitic forms but which passes through the
aliphatic forms without absorption thereby allowing thermal quenching of the diamond like aliphatic forms. Laser power is adjusted such that the
optical removal rate of graphitic forms exceeds the arrival rate. Two laser beams are utilized either by two lasers or by one by suitable optical
imaging. Multiple physical configurations exist to use either one or two lasers.
www.google.com...
which expired last year so we are COMPLETELY FREE
to use lasers to vaporize carbon and deposit onto
glass to make a diamond-like film which can then
hold high-speed silicon circuits and be able to
to be cooled by the fast heat-wicking abilities
of diamond substrates.
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Companies like deBeers (a giant diamond cartel and mining company)
HATE this type of technology because vapor deposition can grow
PERFECT DIAMONDS which mean high quality diamond jewelry can be
made on-the-cheap so they have invented techniques to DETECT
lab grown diamonds.
Detection of chemical vapor deposition grown diamond
US 8514377 B2
Inventors Robert C. Linares, Patrick J. Doering
Original Assignee SCIO Diamond Technology Corporation
Abstract
Diamonds may be identified as grown by the use of chemical vapor deposition.
One or more diamonds may be placed on a surface and exposed to short wavelength
light. Diamonds that fluoresce red may be identified as grown by the use of chemical
vapor deposition. In some embodiments, the diamonds are cooled prior to exposure
to the short wavelength light.
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I also found these almost-expired patents for making thermally conductive
diamond substrates which can make for REALLY FAST CPU/GPU/DSP chips!
Chemical vapor deposition method and apparatus for highly textured diamond film formation
Jai-Young Lee, Yoon-Kee Kim, Yoon-Jung Yong, Young-Soo Han
Original Assignee Korea Advanced Institute Of Science And Technology
US 6110541 A
Abstract
The present invention relates to a CVD apparatus for highly textured diamond film formation and a method for forming a highly textured diamond film on
the surface of a silicone substrate by generating a high density plasma so that each diamond film grain can have the same orientation as the
substrate. The present inventors developed an improved chemical vapor deposition apparatus and a method for highly textured diamond film formation, on
the ground that the nucleation density having a heteroepitaxy relation with a silicone substrate can be increased by modifying the substrate support
and by generating a high density plasma right on the substrate while subjecting the whole substrate to the plasma. In accordance with the present
invention, a diamond film which is close to a single crystal and has a heteroepitaxy relation with the crystalline orientation of a substrate can be
formed in a simple manner.
www.google.com...
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THIS is the company and patent I am thinking to grow MONO-CRYSTALLINE diamonds
GOOD ENOUGH for making really perfect Silicon-On-Diamond Substrates:
Method for growing white color diamonds by using diborane and
nitrogen in combination in a microwave plasma chemical vapor deposition system
EP 2622115 A1
Inventors Devi Shanker Misra
Applicant IIA Technologies Pte. Ltd.
Abstract
The present application discloses the details of a microwave plasma chemical vapor deposition process that uses Nitrogen and Diborane simultaneously
in combination along with the Methane and Hydrogen gases to grow white color diamonds. The invention embodies using nitrogen to avoid inclusions and
impurities in the CVD diamond samples and Diborane for the color enhancement during the growth of diamond. It is also found that heating of the so
grown diamonds to 2000 C results in significant color enhancement due to the compensation of Nitrogen and Boron centers in the samples. The origin of
the various colors in diamond is explained on the basis of the band diagram of CVD diamond.
This is the European Patent and the USA version is here:
Method for growing monocrystalline diamonds
US 8992877 B2
Inventors Devi Shanker Misra
Original Assignee
Lia Technologies Pte. Ltd.,
Indian Institute Of Technology Bombay
Abstract
A method of forming mono-crystalline diamond by chemical vapor deposition, the method comprising the steps of: (a) providing at least one diamond
seed; (b) exposing the seed to conditions for growing diamond by chemical vapor deposition, including supplying reaction gases that include a
carbon-containing gas and hydrogen for growing diamond and include a nitrogen-containing gas; and (c) controlling the quantity of nitrogen-containing
gas relative to other gases in the reaction gases such that diamond is caused to grow by step-growth with defect free steps without inclusions. The
nitrogen is present in the range of 0.0001 to 0.02 vol %. Diborane can also be present in a range of from 0.00002 to 0.002 vol %. The
carbon-containing gas can be methane.
We have to wait until 2029 until the technique
is useable by EVERYONE...although it looks like
the original Florida company research has been
sold or re-purposed for production of Electronic
Substrates used for High Speed Microcircuit applications.
So it looks like Intel may YET STILL HAVE an option to buy
these guys out and start giving us our 50 GHZ i7 CPU !!!!
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We can use almost ANY glass-like poly-or-mono-crystalline substance
as a substrate. Sapphire, Alumina Ceramic, even pure distilled water
ICE could be made into a microcircuit substrate if you want to get
all technical about it!
The issues are cost of making, thermal stability and thermal conductivity,
mechanical strength and electrical NON-CONDUCTIVITY !
edit on 2015/11/12 by StargateSG7 because: sp